TY  - JOUR
VL  - 87
JF  - APPLIED PHYSICS A - MATERIALS SCIENCE AND PROCESSING
A1  -  Vass Csaba
A1  -  Osvay Károly
A1  -  Hopp Béla
A1  -  Bor Zsolt
ID  - publicatio9098
N1  - FELTÖLT?: Vass Csaba - vasscsaba@physx.u-szeged.hu
PB  - Springer-Verlag
EP  - 613
TI  - 104 nm Period Grating Fabrication in Fused Silica by Immersion Two-beam Interferometric Laser Induced Backside Wet Etching Technique
IS  - 4
N2  - A substantial extension of the method of two-beam 
interferometric laser induced backside wet etching (TWIN-LIBWE), 
the immersion TWIN-LIBWE, is used to fabricate fused silica 
gratings with a 104 nm period. The spatially filtered fourth 
harmonic of Nd:YAG laser (lambda=266 nm, tau(FWHM)=8 ns) pulses 
were split into two parts which then interfered at the backside 
of the fused silica target in contact with a liquid absorber 
(naphthalene methyl methacrylate saturated solution with a 
concentration of 1.85 mol/dm(3)). The hypotenuse of a 
rectangular fused silica prism is attached to the fused silica 
target with the use of distilled water as the immersion liquid. 
On steering the beams through the sides of the prisms, the angle 
between the two laser beams has been substantially increased. 
The resulting period of 104 nm is the minimal grating constant 
achievable under such experimental conditions and, to our 
knowledge, the smallest laser generated grating period in fused 
silica at present.
AV  - restricted
Y1  - 2007///
UR  - http://publicatio.bibl.u-szeged.hu/9098/
SN  - 0947-8396
SP  - 611
ER  -