%0 Journal Article
%@ 0947-8396
%A  Vass Csaba
%A  Osvay Károly
%A  Hopp Béla
%A  Bor Zsolt
%D 2007
%F publicatio:9098
%I Springer-Verlag
%J APPLIED PHYSICS A - MATERIALS SCIENCE AND PROCESSING
%N 4
%P 611-613
%T 104 nm Period Grating Fabrication in Fused Silica by Immersion Two-beam Interferometric Laser Induced Backside Wet Etching Technique
%U http://publicatio.bibl.u-szeged.hu/9098/
%V 87
%X A substantial extension of the method of two-beam  interferometric laser induced backside wet etching (TWIN-LIBWE),  the immersion TWIN-LIBWE, is used to fabricate fused silica  gratings with a 104 nm period. The spatially filtered fourth  harmonic of Nd:YAG laser (lambda=266 nm, tau(FWHM)=8 ns) pulses  were split into two parts which then interfered at the backside  of the fused silica target in contact with a liquid absorber  (naphthalene methyl methacrylate saturated solution with a  concentration of 1.85 mol/dm(3)). The hypotenuse of a  rectangular fused silica prism is attached to the fused silica  target with the use of distilled water as the immersion liquid.  On steering the beams through the sides of the prisms, the angle  between the two laser beams has been substantially increased.  The resulting period of 104 nm is the minimal grating constant  achievable under such experimental conditions and, to our  knowledge, the smallest laser generated grating period in fused  silica at present.
%Z FELTÖLTŐ: Vass Csaba - vasscsaba@physx.u-szeged.hu