Ti:sapphire laser ablation of silicon in different ambients

Füle Miklós Jenő and Gárdián Anett and Csontos János and Budai Judit and Tóth Zsolt: Ti:sapphire laser ablation of silicon in different ambients.
JOURNAL OF LASER MICRO NANOENGINEERING, 9 (2). pp. 119-125. ISSN 1880-0688 (2014)

[thumbnail of Ti-S ablation of Si_Fule.pdf]
Preview
Text
Ti-S ablation of Si_Fule.pdf - Published Version

Download (2MB) | Preview
Creators:
Füle Miklós Jenő MTMT
Gárdián Anett
Csontos János MTMT
Budai Judit MTMT
Tóth Zsolt MTMT
Item Type: Journal Article
Journal or Publication Title: JOURNAL OF LASER MICRO NANOENGINEERING
Date: 2014
Volume: 9
Number: 2
Page Range: pp. 119-125
ISSN: 1880-0688
Faculty/Unit: Faculty of Science and Informatics
Institution: Szegedi Tudományegyetem
Language: English
MTMT rekordazonosító: 2704313
DOI azonosító: https://doi.org/10.2961/jlmn.2014.02.0008
Date Deposited: 2017. May. 12. 10:12
Last Modified: 2019. Oct. 31. 14:15
URI: http://publicatio.bibl.u-szeged.hu/id/eprint/9234
Web of Science® Times Cited: 1 View citing articles in Web of Science®

Actions (login required)

View Item View Item

Downloads

Downloads per month over past year