Reducing the incubation effects for rear side laser etching of fused silica

Zimmer Klaus and Ehrhardt Martin and Lorenz Pierre and Wang Xi and Vass Csaba and Csizmadia Tamás and Hopp Béla: Reducing the incubation effects for rear side laser etching of fused silica.
APPLIED SURFACE SCIENCE, 302. pp. 42-45. ISSN 0169-4332 (2014)

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Item Type: Journal Article
Journal or Publication Title: APPLIED SURFACE SCIENCE
Date: 2014
Volume: 302
Page Range: pp. 42-45
ISSN: 0169-4332
Publisher: Elsevier
Faculty/Unit: Faculty of Science and Informatics
Institution: Szegedi Tudományegyetem
Language: English
MTMT rekordazonosító: 2700073
DOI azonosító: https://doi.org/10.1016/j.apsusc.2014.01.115
Date Deposited: 2017. May. 12. 11:25
Last Modified: 2019. Oct. 18. 10:22
URI: http://publicatio.bibl.u-szeged.hu/id/eprint/9093
Web of Science® Times Cited: 14 View citing articles in Web of Science®

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