Influence of the confinement on laser-induced dry etching at the rear side of fused silica

Pan, Yunxiang, Ehrhardt, Martin, Lorenz, Pierre, Han, Bing, Hopp, Béla, Vass, Csaba, Ni, Xiaowu, Zimmer, Klaus: Influence of the confinement on laser-induced dry etching at the rear side of fused silica.
APPLIED PHYSICS A - MATERIALS SCIENCE AND PROCESSING, 122 (4). Terjedelem: 9 p.-Azonosító: 365. ISSN 0947-8396 (2016)

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Item Type: Article
Journal or Publication Title: APPLIED PHYSICS A - MATERIALS SCIENCE AND PROCESSING
Date: 2016
Volume: 122
Number: 4
Page Range: Terjedelem: 9 p.-Azonosító: 365
ISSN: 0947-8396
Publisher: Springer-Verlag
Faculty: Faculty of Science and Informatics
Institution: Szegedi Tudományegyetem
MTMT id: 3043506
DOI id: https://doi.org/10.1007/s00339-016-9925-x
Date Deposited: 2017. May. 11. 16:58
Last Modified: 2019. Oct. 17. 13:50
URI: http://publicatio.bibl.u-szeged.hu/id/eprint/9089
Web of Science® Times Cited: 5 View citing articles in Web of Science®

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