Influence of the confinement on laser-induced dry etching at the rear side of fused silica

Pan Yunxiang and Ehrhardt Martin and Lorenz Pierre and Han Bing and Hopp Béla and Vass Csaba and Ni Xiaowu and Zimmer Klaus: Influence of the confinement on laser-induced dry etching at the rear side of fused silica.
APPLIED PHYSICS A - MATERIALS SCIENCE AND PROCESSING, 122 (4). Terjedelem: 9 p.-Azonosító: 365. ISSN 0947-8396 (2016)

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Item Type: Journal Article
Journal or Publication Title: APPLIED PHYSICS A - MATERIALS SCIENCE AND PROCESSING
Date: 2016
Volume: 122
Number: 4
Page Range: Terjedelem: 9 p.-Azonosító: 365
ISSN: 0947-8396
Publisher: Springer-Verlag
Faculty/Unit: Faculty of Science and Informatics
Institution: Szegedi Tudományegyetem
Language: English
MTMT rekordazonosító: 3043506
DOI azonosító: https://doi.org/10.1007/s00339-016-9925-x
Date Deposited: 2017. May. 11. 16:58
Last Modified: 2019. Oct. 17. 13:50
URI: http://publicatio.bibl.u-szeged.hu/id/eprint/9089
Web of Science® Times Cited: 5 View citing articles in Web of Science®

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