Horváth Bence and Ormos Pál and Kelemen Lóránd:
Nearly Aberration-Free Multiphoton Polymerization into Thick Photoresist Layers.
MICROMACHINES, 8 (7).
Terjedelem: 9-Azonosító: 219.
ISSN 2072-666X
(2017)
Preview |
Text
Cikk_Micromachines.pdf - Published Version Download (600kB) | Preview |
| Creators: |
|
|||
|---|---|---|---|---|
| Item Type: | Journal Article | |||
| Journal or Publication Title: | MICROMACHINES | |||
| Date: | 2017 | |||
| Volume: | 8 | |||
| Number: | 7 | |||
| Page Range: | Terjedelem: 9-Azonosító: 219 | |||
| ISSN: | 2072-666X | |||
| Faculty/Unit: | Not SZTE unit | |||
| Institution: | Other Institution | |||
| Language: | English | |||
| MTMT rekordazonosító: | 3257987 | |||
| DOI azonosító: | https://doi.org/10.3390/mi8070219 | |||
| Date Deposited: | 2021. Nov. 08. 08:50 | |||
| Last Modified: | 2022. Oct. 28. 12:26 | |||
| URI: | http://publicatio.bibl.u-szeged.hu/id/eprint/22828 |
| Web of Science® Times Cited: 16 | View citing articles in Web of Science® |
Actions (login required)
 |
View Item |
Download Statistics
Download Statistics
